(A) Journal articles
1.  Kou-Chen Liu*, Jung-Ruey Tsai, Chi-Shiau Li, Po-Hsiu Chien, Jyun-Ning Chen, and Wen-Sheng Feng, “Characteristics of Transparent ZnO Based Thin Film Transistors with High-k Dielectric Gd2O3 Gate Insulators Fabricated at Room Temperature”, Jpn. J. Appl. Phys., vol. 49, 04DF21 (2010) .
2.  Kow-Ming Chang a, Wen-Hsien Tzeng a, Kou-Chen Liu b,*, Yi-Chun Chan b, Chun-Chih Kuo “Investigation on the abnormal resistive switching induced by ultraviolet light exposure based on HfOx film” Microelectronics Reliability (2010, In Press)
3.  Ting-Hsiang Huang, Zingway Pei*, Wen-Kai Lin, Shu-Tong Chang, and Kou-Chen LiuThin Solid Films 518 (24), p.7381-7384 (2010)., “Oligomer semiconductor/dielectric interface modification for organic thin film transistor hysteresis reduction”,
4.  Kou-Chen Liu*, Wen-Hsien Tzeng, and Kow-Ming Chang “The electrical characteristics of Pt/HfOx/TiN RRAM device impact by plasma effect”, Surf. Coat. Technol. (2010, In Press)
5.  Kou-Chen Liu, Wen-Hsien Tzeng*, Kow-Ming Chang, Yi-Chun Chan, and Chun-Chih Kuo, “Effect of UV-light exposure to HfOx/TiN RRAM device”, Thin Solid Films 518 (24), p. 7460-7463 (2010).
6.  Kou Chen Liu, Wen Hsien Tzeng*, Kow Ming Chang, Yi Chun Chan, Chun Chih Kuo, Chun Wen Cheng, “The resistive switching characteristics of Ti/Gd2O3/Pt RRAM device”, Microelectronics Reliability, vol. 50, pp. 670-673 (2010).
7.  Kou-Chen Liu *, Hsiang-Ling Cheng, Jung-Ruey Tsai, Yi-Lin Chiang, Yu-Chen Hsieh and Der-Jun Jan “Investigation of SiOxCy Film as Gas Permeation Barrier and Encapsulation for Full Transparent FOLED by a Permanent Helicon Plasma Source”, Thin Solid Films 518, p6195-6198 (2010).
8.  Shou-Yi Kuo, Kou-Chen Liu, Fang-I Lai, Jui-Fu Yang, Wei-Chun Chen, Ming-Yang Hsieh, Hsin-I Lin and Woei-Tyng Lin, “Effects of RF power on the structural, optical and electrical properties of Al-doped zinc oxide films”, Microelectronics Reliability, vol. 50, pp. 730-733 (2010).
9.  Wen-Kai Lin, Chi-Shiau Li, Jung-Ruey Tsai, Shu-Tong Chang and Kou-Chen Liu, “Room temperature fabricated transparent a-IZO based TFT using high-κ HfO2 as gate insulator”, Thin solid films, (Submitted)
10. Tien-Lung Chiu, Haiqing Xianyu, Zhibing Ge, Jiun-Haw Lee, Kou-Chen Liu, and Shin-Tson Wu, “Transflective device with a transparent organic light-emitting diode and a reflective liquid-crystal device”, Journal of the SID 17/12, p.1009-1013, 2009
11. K.C.Liu, J.J.Luo, and L.K.Dal., “The evaluation of implanted InSb p+n diode passivated with composite anodic oxide/SiOx stack”, phys. Stat. Sol. (a), vol. 205, p.2469-2475, 2008.
12. Kou-Chen LIU, Yen-Hsun LU, Yung-Hsin LIAO, and Bor-shiun HUANG ,”Utilizing transparent ZnO thin film as permeation barrier to improve light outcoupling and longevity of top-emission polymer light-emitting devices”, Jpn. J. Appl. Phys. 47, No. 4, p.3162-3166, 2008.   
13. Kou-Chen Liu, Chao-Wen Teng, Yen-Hsun Lu, Jiun-Hao Lee, and Lai-Cheng Chen, “Improving the performance of transparent PLEDs with LiF/Ag/ITO cathode”, Electrochemical and Solid State Lett., 10(10) p.120-122, 2007.
14. SMaikap, H Y Lee, T-YWang, P-J Tzeng, C C Wang, L S Lee, K C Liu, J-R Yang and M-J Tsai, “Charge trapping characteristics of atomic-layer-deposited HfO2 films with Al2O3 as a blocking oxide for high-density non-volatile memory device applications”, Semicond. Sci. Technol. 22, p.884–889, 2007.
15. K. C. Liu, C. W. Teng, Y. H. Lu, Y. C. Tsai, and S. H. Chou, “The Experimental Study on Transparent PLEDs Using LiF/Ag/ITO Cathode”, Jpn. J. Appl. Phys. 46, p.2704-2708, 2007.
16. Jiun-Haw Lee, Haiqing Xianyu, Zhibing Ge, Xinyu Zhu, Yen-Hsun Lu, Chao-Wen Teng, Kou-Chen Liu, and Shin-Tson Wu, “Hybrid Transflective Displays using Vertically Integrated Transparent OLED and Reflective LCD”, SID DIGEST, 3802, p.1810-1812, 2007.
17. K. C. Liu, C. W. Teng, C .C. Lee, K. Y. Cheng, Y. H. Lu, W. T. Liu, C. C. Chen, L. C. Chen, “ Experimental Study of Chemical Reaction between LiF and Polyflourene Interface during Sputtering Indium Tin Oxide (ITO) Cathode for Top Emission Polymer Light Emitting Devices”, Jpn. J. Appl. Phys. 45 p.3742-3745, 2006.  
18. Kow-Ming Chang, Jiunn-Jye Luo, Cheng- Der Chiang and Kuo- Chen Liu, “Wet Etching Characterization of InSb for Thermal Imaging Applications”, Jpn. J. Appl. Phys. 45, p.1477-1482, 2006.  
19. K. C. Liu , S. Maikap, C. H. Wu, Y. S. Chang, P. S. Chen, “ The impact of Hf metal predeposition on the physical and electrical properties of ultrathin HfO2 films on Si0.9954C0.0046/Si heterolayers”Semiconductor Science and Technology 20 (10), pp. 1016-1021
20. K. C. Liu, Y. S. Liu, S. Maikap and P. S. Chen, “Characteristics of ultrathin Hf-silicate gate dielectrics on Si0.9954C0.0046/Si heterolayers, Jpn. J. Appl. Phys. 44, p.2447-2449, 2005.
 
 
(B)Conference & proceeding papers:
1.  Jung-Ruey Tsai, Chi-Shiau Li, Jyun-Ning Chen, Chien-Jung Tseng, Po-Hsiu Chien, Wen-Sheng Feng and Kou-Chen Liu, “Characteristics of Transparent ZnO Based Thin Film Transistors with High-k Dielectric Gd2O3 Gate Insulators Fabricated at Room Temperature”, International Conference on Solid State Devices and Materials (SSDM), Oct. 7-9(2009), paper no. 5580.
2.  Jung-Ruey Tsai, Chi-Shiau Li, Shang-Yu Tsai, Jyun-Ning Chen, Po-Hsiu Chien, Wen-Sheng Feng and Kou-Chen Liu, “Transparent ZnO based thin film transistors fabricated at room temperature with high-k dielectric Gd2O3 gate insulators”, 9th International Meeting on Information Display (IMID), Oct. 12-16 (2009), paper no. p1390.
3.  Wen-Kai Lin, Chi-Shiau Li, Kou-Chen Liu and Shu-Tong Chang, “Fabrication low-voltage amorphous indium zinc oxide(a-IZO) thin film transistors using high dielectric HfO2 as gate insulator at room temperature”, International Conference on Solid State Devices and Materials (SSDM), Oct. 7-9(2009)
4.  Wenkai Lin, Chi-Shiau Li, Kou-Chen Liu, Shu-Tong Chang, “Fabrication low-voltage amorphous indium zinc oxide transparent thin film transistors using high dielectric HfO2 as gate insulator”, International Conference on Plasma Surface Engineering (ICMAP), Sep 20-25, (2009), 2009-213
5.  T. H. Huang, Z. Pei, W. K. Lin, S. T. Chang and K. C. Liu, “Interface Trap Reduction based on Poly(styrene-co-methyl methacrylate)/Hafnium Oxide Bilayer Dielectrics for Low Voltage OTFT”, International Conference on Solid State Devices and Materials (SSDM), Oct. 7-9(2009)
6.  H. L. Cheng, C. J. Tseng, Y. L. Chiang , Y. C. Hsieh, K. C. Liu, D. J. Jan, “Investigation of SiOxCy Film as Gas Permeation Barrier and Encapsulation for Full Transparent FOLED by a Permanent Helicon Plasma Source”, International Conference on Plasma Surface Engineering (ICMAP), Sep 20-25, (2009), 2009-306
7.  C. J. Tseng, H. L. Cheng, Y. L. Chiang, Y. C. Hsieh,K. C. Liu, M. H. Zheng, F. Y. Tsai, “High performance fully transparent OLED encapsulated using a novel permeation barrier by ALD”, International Conference on Solid State Devices and Materials (SSDM), Oct. 7-9(2009), paper no. 5746.
8.  K. C. Liu, H. L. Cheng , C. J Tseng, Y. C. Hsieh , Y. L. Chiang, “High performance full transparent OLED device using IZO as top cathode”, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics, April 15-17, (2009), 17a-O002
9.  Tien-Lung Chiu, Haiqing Xianyu, Zhibing Ge, Jiun-Haw Lee, Kou-Chen Liu, Shin-Tson Wu, “Transflective device with a transparent organic light-emitting diode and a reflective liquid-crystal device”,The Society for Information Display (SID), (2009), MS #080409-0123R.
10. Kuo Chen Liu, Wen Hsien Tzeng, Kow Ming Chang, Yi Chun Chan, Chun Chih, Kuo, Chun Wen Cheng, “Transparent resistive random access memory (T-RRAM) based on Gd2O3 film and its resistive switching characteristics”, IEEE International NanoElectronics Conference, Jan 3-8, (2010)
11. Kow Ming Chang, Wen Hsien Tzeng, Kuo Chen Liu, “Effects of UV Light Exposure to the Electrical Characteristics of HfOx”, RRAM Device TACT International Thin Films Conference (TACT 2009), Dec 14-16, (2009), C263-P
12. Kow Ming Chang, Wen Hsien Tzeng, Kuo Chen Liu, “Plasma Effect to the Electrical Characteristics of Pt/HfOx/TiN RRAM Device”, International Conference on Plasma Surface Engineering (AEPSE), Sep 20-25, (2009), 2009-357
13. Kow Ming Chang, Wen Hsien Tzeng, Kuo Chen Liu, “Improve stabilization of conduction current of AlOy/HfOx/TiN RRAM device with UV-light exposure treatment”, 6th International Symposium on Transparent Oxide Thin Films for Electronics and Optics, April 15-17, (2009), 15p-P067
14. Wen-Sheng Feng, Po-Hsiu Chien, Jyun-Ning Chen, Jung-Ruey Tsai, Sung-Cheng Hu, and Kou-Chen Liu, “High transparent ZnO-based thin film transistor with Gd2O3 dielectrics fabricated at room temperature”, Optics and Photonics Taiwan (OPT), Dec. 11-12, (2009), paper no.
15. J. N. Chen, J. R. Tsai, C. S. Li, P. H. Chien, W. S. Feng, and K. C. Liu, “Characterization of O2 Plasma treatment of HfO2 Films in Metal/HfO2/ITO Structure”, 2009 International Electron Devices and Materials Symposia (IEDMs 2009), paper no: 477.
16. Wen-Kai Lin, Chi-Shiau Li, Kou-Chen Liu, Shu-Tong Chang, Jung-Ruey Tsai “Room temperature deposited IZO TTFT using high dielectric HfO2 as gate insulator”, 2009 International Electron Devices and Materials Symposia (IEDMs), Nov 19-20, (2009)
17. Ting-Hsiang Huang, Hui-Chen Huang, Zingway Pei, Wen-Kai Lin, Kou-Chen Liu and Shu-Tong Chang, “Hafnium Oxide Surface Modification by Coating Poly(styrene-co-methyl methacrylate) for Low Voltage OTFT”, 2009 International Electron Devices and Materials Symposia (IEDMs), Nov 19-20, (2009)
18. Ting-Hsiang Huang, Zingway Pei*, Wen-Kai Lin, Shu-Tong Chang and Kou-Chen Liu, "Oligomer Semiconductor/Dielectric Interface Modification for OTFT Hysteresis Reduction", TACT 2009 International Thin Films Conference, National Taipei University of Technology, Taipei, Taiwan, P.131, December 14-16, 2009.
19. Chun-Wen Cheng, Wen-Hsien Tseng, Chun-Chi Kuo, Yi-Chun Chan, Kou-Chen Liu, “Resistive random access memory (RRAM) based on Gd2O3 Resistive Layer and its Resitive Switching Characteristics”, Optics and Photonics Taiwan (OPT), Dec. 11-12, (2009), paper no. GP030.
20. Kou Chen Liu, Wen Hsien Tzeng, Kow Ming Chang, Chun Chih, Kuo, Yi Chun Chan, Chun Wen Cheng, “Transparent resistive random access memory (T-RRAM) based on Gd2O3 film and its nonvolatile resistive switching”, 2009 International Electron Devices and Materials Symposia (IEDMs), Nov 19-20, (2009)
21. Hsiang-Ling Cheng, Yi-Lin Chiang, Chien-Jung Tseng, Yu-Chen Hsieh, Kou-Chen Liu and Der-Jun Jan, “Investigation of SiOxCy Film as the Encapsulation Layer for Transparent OLED by a Hollow Cathode Discharge Plasma”, White LEDs 2009, Dec. 13-16 (2009), paper no: 262.
22. Hsiang-Ling Cheng, Chien-Jung Tseng, Yi-Lin Chiang, Yu-Chen Hsieh, Kou-Chen Liu, “High performance transparent OLED device using IZO as top cathode”, White LEDs 2009, Dec. 13-16 (2009), paper no: 247.
23. Fang-I Lai, Kou-Chen Liu, Jui-Fu Yang, Hsin-I Lin, Ming-Yang Hsieh, K. T. Chen, T. H. Chen, T. J. Chen, Shou-Yi Kuo, “濺鍍功率對電漿環外區之攙鋁氧化鋅薄膜之光電特性研究”, 2009台灣光電科技研討會（OPT2009）, Taiwan (2009.12).
24. Fang-I Lai, Kou-Chen Liu, Jui-Fu Yang, Hsin-I Lin, Ming-Yang Hsieh, Wei-Chun Chen, Shou-Yi Kuo, “Effects of RF power on the structural, optical and electrical properties of Al-doped zinc oxide films”, 2009 International Electron Devices and Materials Symposium (IEDMS), Taiwan (2009.11).
25. 張連璧、張淵舜、鄭明哲、劉國辰、郭守義, “ZnO deposition for flip-chip thin film varistor applications”, 第七屆台塑關係企業應用技術研討會 (June, 2008)
26. Kow Ming Chang, Wen Hsien Tzeng, Kuo Chen Liu, Pang Shiu Chen, Heng, Yuan. Lee, M.J. Tsai, and J.P. Lin, “Effect of Top Electrode on the HfOx/TiN RRAM Device”, Extended Abstracts of IWDTF, Nov 5-7, (2008), p.49-50.
27. Chien-Jung Tseng, Yung-Hsin Liao, Shang-Yu Tsai, Chi-Shiau Li, Kou-Chen Liu, “High performance Fully Transparent Polymer Light-Emitting Devices with Transparent Indium Zinc Oxide Cathode” SSDM, 2008
28. Yen-Hsun Lu, Yung-Hsin Liao, Cheng-Yang Shih, Yu-Chi Huang , Kou-Chen Liu, “Utilizing Transparent ZnO Thin Film as Permeation-Barrier to Assist Top Emission Polymer Light-Emitting Devices Light Outcoupling and Longevity”, SSDM, p.196-197, 2007.
29. Chen-Chun Chen, Yao-Chou Tsai, K.C. Liu, Yung-Ting Chang,and Jiun-Haw Lee ’Optical Simulation for Top emission PLEDs with IZO cathode ‘ OLED/LED, luminescent materials 2007
30. Chen-Chun Chen, Yao-Chou Tsai, K.C. Liu, Yung-Ting Chang,and Jiun-Haw Lee ’Optical Simulation for Top emission PLEDs with TCO cathode”, The 10th Asia Symposium Information Display, ASID, 2-3 August, 2007, Orchard Hotel, Singapore.
31. Chen-Chun Chen, Yao-Chou Tsai, K.C. Liu, Yung-Ting Chang,and Jiun-Haw Lee ’Optical Simulation for Top emission PLEDs with TCO cathode”, The 14th Information Display Worksoph, IDW.
32. C. W. Teng, Y. H. Lu, K. C. Liu, L. C. Chen, S. C. Hu ’The influence of inserting noble metal for transparent PLEDs”, Materials Research Society 2007.
33. Chi-hung Wu, Kou-Chen Liu, Heng-Yuan Lee, Pang-Shiu Chen, Ming-Jinn Tasi, Ren-Wei Teng,Yao-Ren Tsai, “Reproducible switching effect in thin HfO2 film for the resistive memory application”, VLSI-TSA-TECH Technical Program Committee, 2007 spring.
34. Jiun-Haw Lee, Haiqing Xianyu, Zhibing Ge, Xinyu Zhu, Yen-Hsun Lu, Chao-Wen Teng, Kou-Chen Liu and Shin-Tson Wu, “ Hybrid Transflective Display Using Vertically Integrated Transparent OLED and Reflective LED”, Digest of Technical Papers-2007 SID International Symposium, 1810, 2007. (EI, invited)
35. Jiun-Haw Lee, Haiqing Xianyu, Zhibing Ge, Xinyu Zhu, Yen-Hsun Lu, Chao-Wen Teng, Kou-Chen Liu and Shin-Tson Wu, “ Hybrid Transflective Display Using Vertically Integrated Transparent OLED and Reflective LED”, SID07, Long Beach, California USA, 2007. (invited).
36. S-Y Nien, Nan-Fu Chiu, Y-C Tsai, C-W Lin, K-C Liu and J-H Lee, “Extraction Efficiency Enhancement of an OLED using surface Plasmon Resonance”, Asia Shanghai, China, Oct. 2007 (Invited).
37. J-H Lee, Haiqing Xianyu Zhibing, Kou-Chen Liu and Shin-Tson Wu, “Tandem reflective LED and OLED”, 7th International Meeting on Information Display (IMID 2007), Daegu, Korea, Aug. 2007.
38. Y-C Tsai, C-C Chen, K-C Liu, Y-T Chang and J-H Lee, “Optical Simulation for Transparent and Top Emission PLEDs to Optimize the Metal/ITO cathode”, 7th International Meeting on Information Display (IMID 2007), Daegu, Korea, Aug. 2007.
39. S-H Chou, Y-H Lu, C-W Teng, K-C Liu and T. W. Pi, Experimental study of Ag/LiF/PF Interface for Top Emission PLEDs by Synchrotron radiation Photoemission Spectroscopy”, SSDM 2007, pp.198-199.
40. S-H Chou, Y-H Lu, C-W Teng, K-C Liu and T. W. Pi, Experimental study of Ag/LiF/PF Interface for Top Emission PLEDs by Synchrotron radiation Photoemission Spectroscopy”, International Conference on Plasma Surface Engineering (ICMAP) 2007.
41. C. W. Lin, J. H. Lin, and K. C. Liu ’Investigation for hafnium oxide as an insulator layer of organic thin film transistor’ Solid State Device Materials, pp.922-923, 2006
42. C. W. Teng, Y. H. Lu, Y. C. Tsai, K.Y. Chang, S. H. Chou, K. C. Liu, L. C. Chen, Y. C. Fang, H. E. Huang ’The Experiment and Simulation study Top Emission PLEDs Using LiF/Ag/ITO Cathode’ Solid State Device Materials, pp.78-79, 2006
43. Y. H. Lu, C. W. Teng, Y.C. Tsai, K.Y. Chang, S.H. Chou, K. C. Liu, W. T. Liu, C. C. Chen, L. C. Chen ’The Performance of Top Emission PLED Device Using LiF/Ag/ITO Cathode’ TDC, Taipei, 15-16 June, 2006
44. K. C. Liu, C. W. Teng, W. T. Liu, C. C. Chen, L. C. Chen, ’The Chemical Reaction between LiF and Polyfluorene Affect the Performance of Top Emission PLED Devices During Sputtering ITO Cathode’ Symposium D, MRS, Fall-Meeting, 2005.
45. C. W. Teng, C. C. Lee and K. C. Liu* ’Experimental study of reaction between LiF and polyflourene interface during sputtering ITO cathode for Top emission PLED device’ Solid State Device Materials pp.960-961 2005
46. C.H. Lin, K.C. Li, J.P. Hua, K.C. Liu, “Fabrication of the low operating voltage Poly(3-hexylthiophene) transistor using sputtering Al2O3/HfO2/Al2O3 stacking insulator”, SSDM 2005.
47. S. Maikap, P. J. Tzeng, L. S. Lee, H. Y. Lee, C. C. Wang, P. H. Tsaib K. S. Chang-Liao, C. W. Jen, K. C. Liu, P. R. Jeng and M.-J. Tsai, “High-k Hf-based charge trapping layer with Al2O3 blocking oxide for high-density flash memory”, VLSI-TSA-TECH Technical Program Committee, 2005.
48. C. W. Teng, K. C. Liu, W. T. Liu, C. C. Chen, L. C. Chen, “ The Chemical Reaction between LiF and Polyflourene Affect the Performance of Top Emission PLED Devices During Sputtering ITO”, Material Research Society, 2005